My research involves chemical vapour deposition (CVD) of both III-V semiconductors and various oxides (or metals). The atmospheric-pressure CVD systems employ thermal, flame and plasma technologies, and multiple precursor delivery technologies including flash evaporation and aerosol. These are all capable of scale-up and integration into industrial processes. They are used for producing tailored thin film coatings with added value functional properties. CVD technology can be adapted to meet a range of nanostructured coating and surface structures which include abrasion resistant, biocidal, conductive, anti-reflection, thermochromic and hydrophobic materials. One particular use is for increased solar cell efficiency via design of CVD equipment and optimisation of the layers which make up the cells.
Another area of interest is that of self-assembly of 3D photonic materials and 1D nanowires. This includes exploration of the photonic behaviour of both bare and infilled opals, which led to the production of the first reported inverse opal systems based on InP and GaP and that of a conducting inorganic medium (SnO2).
£750 towards costs of EUROCVD19 conference.
2013 to 2017, Dissemination Officer for EC FP7 grant PLIANT.
2008 to 2012, Dissemination Officer for EC FP7 grant N2P.
Since 2004, member XPS management committee at Manchester University.
Since 2000, referee for journals including Advanced Functional Materials, J.Photochem.PhotobiolA, J.Materials Processing Technol, J.Non-Crystalline Solids, Thin Solid Films
EPSRC grant review